Accession Number:

ADP007245

Title:

Interface Imperfections in Metal/Si X-Ray Multilayer Structures,

Descriptive Note:

Corporate Author:

AT AND T BELL LABS MURRAY HILL NJ

Personal Author(s):

• Windt, David L.
• Hull, R.
• Waskiewicz, W. K.

Report Date:

1992-05-22

Pagination or Media Count:

5.0

Abstract:

The structural and optical properties of optimized MoSi and RuSi X-ray multilayers prepared by sputter deposition have been examined using high-resolution TEM, optical profilometry, and X-ray and soft X-ray reflectance. In addition, the effect of sputter gas pressure on the structure and performance of RuSi multilayers has been investigated using the same techniques. We find that, similar to previous results for MoSi, lower pressure results in smoother layers. For optimized multilayers, interfacial roughness is negligible compared to interfacial diffuseness-, the presence of amorphous interlayer regions in both of these systems is the major cause of reduced reflectance. The growth mechanism associated with these interlayers is unclear, though it seems likely that it is a diffusion process rather than the result of a ballistic effect.

Descriptors:

• *SOFT X RAYS
• ADDITION
• DEPOSITION
• HIGH RESOLUTION
• LAYERS
• OPTICAL PROPERTIES
• PRESSURE
• REFLECTANCE
• RESOLUTION
• STRUCTURES
• X RAYS
• LITHOGRAPHY

Subject Categories:

• Photography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE