Accession Number:

ADP007244

Title:

XUV Conversion Efficiency in a Low-Intensity KrF Laser Plasma for Projection Lithography,

Descriptive Note:

Corporate Author:

SANDIA NATIONAL LABS ALBUQUERQUE NM

Report Date:

1992-05-22

Pagination or Media Count:

4.0

Abstract:

Measurements of XUV conversion efficiency in the 2028OeV range were made on a low intensity 7 x 1 O10 W cm2 KrF laser-produced plasma with seven targets of varying Z. Novel mass-limited targets were studied to develop ultra-low debris laser-targets for projection lithography.

Subject Categories:

  • Photography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE