X-Ray Production Efficiency at 130 A from Laser-Produced Plasmas,
LAWRENCE LIVERMORE NATIONAL LAB CA
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X-ray production at 130 A is measured from laser-produced plasmas using sub-Joule energies. Dependence of efficiency on target material and intensity are presented. Projection x-ray lithography systems require high brightness, narrow band sources in the soft x-ray region. Source requirements are set by the multilayer x-ray imaging optics and these typically have a bandpass of a few per cent below 200 eV. We have begun investigating laser-produced plasmas as a potential x-ray source for projection lithography. Although these are typically broadband sources they can be efficient radiators in the sub-kilovolt region. By proper choice of laser wavelength, pulse length, irradiation intensity, and target material, emission in the bandpass of interest can be optimized.