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Accession Number:
ADP007239
Title:
Soft-X-Ray Projection Imaging Using a Laser Plasma Source,
Descriptive Note:
Corporate Author:
SANDIA NATIONAL LABS ALBUQUERQUE NM
Report Date:
1992-05-22
Pagination or Media Count:
4.0
Abstract:
The feasibility of producing small feature sizes in resists using soft x-ray projection lithography has been demonstrated. Experiments by AT and T Bell Laboratories have achieved features small as 0.05 microns using a Schwarzschild objective and 140 angstrom radiation from an undulator at the National Synchrotron Light Source. We describe here a similar imaging system in which the illumination is derived from a high-fluence laser plasma source LPS of soft x-rays instead of a synchrotron radiation source. The laser plasma source has been shown to be a useful illumination source for soft x-ray microscopy.
Distribution Statement:
APPROVED FOR PUBLIC RELEASE