Design of an Extended Image Field Soft-X-Ray Projection System,
STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE AMSTERDAM (NETHERLANDS) INS TITUUT VOOR ATOOM EN MOLECUULFYSICA
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A soft x-ray projection system has been designed, consisting of all-reflectance multilayer optics. The design enables 0.1 micron resolution over a wide circular image field of 12.5 mm2. Optical systems for X-ray projection lithography use various normal-incidence geometries to realize sub-0.1 micron resolution with a depth of focus of 0.5 micron. To meet all other lithography imaging requirements, with respect to telecentricity, distortion, and image field size, the number of components in such a design can be as high as five, often including aspherical elements.