Accession Number:

ADP007238

Title:

Design of an Extended Image Field Soft-X-Ray Projection System,

Descriptive Note:

Corporate Author:

STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE AMSTERDAM (NETHERLANDS) INS TITUUT VOOR ATOOM EN MOLECUULFYSICA

Personal Author(s):

• Bijkerk, F.
• Voorma, H. -J.
• Puik, E. J.
• Louis, E.
• Van Dorssen, G. E.

Report Date:

1992-05-22

Pagination or Media Count:

3.0

Abstract:

A soft x-ray projection system has been designed, consisting of all-reflectance multilayer optics. The design enables 0.1 micron resolution over a wide circular image field of 12.5 mm2. Optical systems for X-ray projection lithography use various normal-incidence geometries to realize sub-0.1 micron resolution with a depth of focus of 0.5 micron. To meet all other lithography imaging requirements, with respect to telecentricity, distortion, and image field size, the number of components in such a design can be as high as five, often including aspherical elements.

Descriptors:

• *LITHOGRAPHY
• REFLECTANCE
• OPTICS
• GEOMETRY
• MIRRORS

Subject Categories:

• Photography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE