Accession Number:

ADP007230

Title:

Throughput Estimate of an X-Ray Projection Lithography System,

Descriptive Note:

Corporate Author:

HITACHI LTD TOKYO (JAPAN) CENTRAL RESEARCH LAB

Personal Author(s):

• Itou, Masaaki
• Terasawa, Tsueno
• Moriyama, Shigeo

Report Date:

1992-05-22

Pagination or Media Count:

4.0

Abstract:

The feasibility of X-ray projection lithography is discussed with emphasis on throughput issues. A lithography system using 13nm radiation from a compact storage ring was designed. This system consists of a grazing incidence condenser mirror, a multilayer condenser mirror, a multilayer reflection mask , an imaging system with four multilayer mirrors, and an X-ray window. Calculations show that the X-ray power incident onto that the X-ray power incident onto a wafer is 0.5mW. A highly sensitive resist is required to a achieve practical wafer throughput.

Descriptors:

• *LITHOGRAPHY
• SOFT X RAYS
• RANDOM ACCESS COMPUTER STORAGE

Subject Categories:

• Photography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE