Sputter Deposition of Ferroelectric Thin Films,
NORTH CAROLINA STATE UNIV AT RALEIGH DEPT OF MATERIALS SCIENCE AND ENGINEERING
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Ferroelectric films are typically deposited by a variety of techniques, the two most common being chemical methods sol-gel, metalorganic decomposition and sputtering. In this paper we briefly review the sputtering techniques, and then discuss ion beam sputter deposition in greater detail. In particular, ion beam sputter deposition of epitaxial lead zirconate titanate PZT films is described. It is shown that the films with compositions close to the morphotropic boundary typically show well-developed ferroelectric hysteresis loops, Pmax around 45 micron Ccm2, and Pr around 20 micron Ccm2. In comparison with typical polycrystalline sol-gel PZT films, however, coercive fields of thin epitaxial films are large 120 - 200 k-Vcm for 95 nm films. The pulsed fatigue behavior is remarkably similar to a polycrystalline non-oriented sol-gel PZT film investigated for comparison. The similarities suggest that the aging behavior may be dominated by the electrodes, which were Pt in both systems.
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