Accession Number:

ADP006692

Title:

Liquid Source CVD,

Descriptive Note:

Corporate Author:

SYMETRIX CORP COLORADO SPRINGS CO

Report Date:

1991-04-05

Pagination or Media Count:

9.0

Abstract:

This work entails an investigation Of a new method for depositing complex thin films by, injecting stoichiometrically correct liquid sources into a vacuum chamber such that thin films are formed on silicon substrates at room temperature under closely controlled conditions.

Subject Categories:

  • Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE