Accession Number:

ADP003949

Title:

Characteristics of Ion Implanters for Fabrication of Electronic Devices,

Descriptive Note:

Corporate Author:

ARMY ELECTRONICS RESEARCH AND DEVELOPMENT COMMAND FORT MONMOUTH NJ ELECTRONICS TECHNOLOGY/DEVICES LAB

Personal Author(s):

Report Date:

1984-06-01

Pagination or Media Count:

11.0

Abstract:

This paper concerns the characteristics of ion implanters for fabrication of electronic devices. High voltage implanters have been designed for implanting ions deeper into semiconductor materials. They are now standardized at 400 keV.

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE