Accession Number:

ADP002466

Title:

Sputtered C-Axis Inclined Piezoelectric Films and Shear Wave Resonators,

Descriptive Note:

Corporate Author:

IOWA STATE UNIV AMES

Personal Author(s):

• Wang,J. S.
• Lakin,K. M.
• Landin,A. R.

Report Date:

1983-01-01

Pagination or Media Count:

7.0

Abstract:

Sputtered piezoelectric films are being studied for potential application to VHF through microwave frequency acoustic wave devices. This paper reports on the growth and characterization of C-axis inclined ZnO and A1N films for shear wave resonators. Orientation relationships for shear wave excitation were calculated for these films which suggest a nearly pure shear wave could be excited with films having C-axis orientation approximately 45 deg. from the surface normal. At other angles, quasi-shear and quasi-longitudinal waves are excited. The well oriented ZnO or A1N films with C-axis inclined from the film normal were grown in a reactive dc planar magnetron sputtering system having an auxiliary anode structure. These films were evaluated by scanning electron microscopy SEM and BAW device measurements. The columnar structure of the C-axis crystallites, inclined from the Si substrate normal, was clearly visible in SEM. Films having C-axis inclination angles up to 45 deg. and thicknesses up to 10 microns have been obtained.

Descriptors:

• *Piezoelectric materials
• *Films
• *Acoustic resonators
• Fabrication
• Sputtering
• Zinc oxides
• Aluminum compounds
• Molecular structure
• Orientation(Direction)

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE