Accession Number:

ADD019521

Title:

Fluoroaliphatic Cyanate Resins for Low Dielectric Applications

Descriptive Note:

Patent, Filed 13 Jan 1998, patented 27 Jul 1999

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s):

Report Date:

1999-07-27

Pagination or Media Count:

10.0

Abstract:

The present invention is a cyanate resin monomer having the formula NCO-CH2-CF2n-CH2-OCN where n is an even integer from 6 to 10, inclusive. Another aspect of the invention is an essentially pure cyanate resin monomer having the formula NCO-CH2-CF2n-CH2-OCN where n3, 4, 6, 5, or 10. Another aspect of the invention is a prepolymer made by the process of heating a monomer of the invention to a conversion below the gel point. Another aspect of the invention is a method for deposition an interlevel dielectric resin on an integrated circuit, having the steps a coating the integrated circuit with a thin film of a prepolymer made by the process of heating a monomer of the invention to below the gel point, and b curing the prepolymer to at least the gel point. Another aspect of the invention is a low dielectric thermoset polymer resin made from these monomers. Another aspect of the invention is a composite of a resin of the invention combined with another material or materials, for structural andor electronic applications. Such materials include powders and fibers made from, e.g., fused silica or quartz. Another aspect of the invention is making and purifying the monomers of the invention.

Subject Categories:

  • Organic Chemistry
  • Laminates and Composite Materials

Distribution Statement:

APPROVED FOR PUBLIC RELEASE