Accession Number:

ADD019460

Title:

X-Ray Source for Lithography %

Descriptive Note:

Patent filed 9 May 90, patented 6 Apr 99

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Report Date:

1999-04-06

Pagination or Media Count:

6.0

Abstract:

An x-ray lithography device in which a beam of electrons interacts with a microwave field of a quasi-optical maser such as a quasi-optical gyrotron. This maser comprises a pair of spaced mirrors defining a quasi-optical cavity there between, with one mirror being provided with an orifice to permit extraction of the x-ray beam produced. A Bragg reflector is connected to the mirror orifice to reduce the microwave power loss from the device through the orifice. Electrons injected in the maser cavity arc caused to wiggle by the interacting microwave field, which functions as an undulator, so as to produce a non-coherent x-ray beam that travels along the longitudinal axis of the cavity and exits through the mirror orifice.

Subject Categories:

  • Electrical and Electronic Equipment
  • Nuclear Physics and Elementary Particle Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE