Accession Number:

ADD019303

Title:

Bright Beam Method for Super-Resolution in E-Beam Lithography

Descriptive Note:

Patent, Filed 23 Dec 96, patented 20 Oct 98

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Report Date:

1998-10-20

Pagination or Media Count:

9.0

Abstract:

The invention pertains to a method and apparatus for bonding a layer of coating material onto a substrate with minimal bulk heating of the substrate. A pulsed electron beam generator is used to produce high energy electrons at the beginning of the pulse and a larger number of lower energy electrons at the end of the pulse. A thin sacrificial or ablative layer of an easily vaporized material such as tin is placed on top the coating. The high energy electrons penetrate through the ablative and coating layers. The ablative layer is heated to a molten state, causing it to vaporize. The ablation process generates a force on the coating layer which drives it into the substrate.

Subject Categories:

  • Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE