Accession Number:

ADD018711

Title:

In-Situ Monitoring and Feedback Control of Metalorganic Precursor Delivery

Descriptive Note:

Patent, Filed 6 Oct 95, patented 29 Jul 97

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Report Date:

1997-07-29

Pagination or Media Count:

11.0

Abstract:

The in-situ monitoring of metal organic precursor delivery in a metal organic chemical vapor deposition oxide system in high temperature super conductors HTSC film growth is accomplished by utilizing the distinct absorbance bands for metal organic compounds. As an ultraviolet-visible light beam is passed through an effluent metal organic gas stream the relative change in ultraviolet-visible absorbance of the ultraviolet-visible light beam passing through the effluent metal organic gas stream is monitored. Stoichiometry control is achieved by feeding back absorbance data to a controlling parameter such as carrier gas mass flow rate, thus stabilizing fluctuations in source concentration in the bubble effluent from a computer or similar monitoring device. Such an apparatus and method improves the stoichiometry control of mixed metal oxide film deposition and increases the manufacturability of thin films.

Subject Categories:

  • Inorganic Chemistry
  • Physical Chemistry
  • Laminates and Composite Materials

Distribution Statement:

APPROVED FOR PUBLIC RELEASE