Accession Number:

ADD018186

Title:

In-Situ Monitoring and Feedback Control of Metalorganic Precursor Delivery.

Descriptive Note:

Patent Application, filed 6 Oct 95,

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s):

Report Date:

1995-10-06

Pagination or Media Count:

23.0

Abstract:

The in-situ monitoring of metalorganic precursor delivery in a metalorganic chemical vapor deposition oxide system in high temperature super conductors HTSC film growth is accomplished by utilizing the distinct absorbance bands for metalorganic compounds. As an ultraviolet-visible light beam is passed through an effluent metalorganic gas stream the relative change in ultraviolet-visible absorbance of the ultraviolet-visible light beam passing through the effluent metalorganic gas stream is monitored. Stoichiometry control is achieved by feeding back absorbance data to a controlling parameter such as carrier gas mass flow rate, thus stabilizing fluctuations in source concentration in the bubble effluent from a computer or similar monitoring device. Such an apparatus and method improves the stoichiometry control of mixed metal oxide film deposition and increases the manufacturability of thin films.

Subject Categories:

  • Inorganic Chemistry
  • Physical Chemistry
  • Laminates and Composite Materials
  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE