Apparatus and Method for Achieving Growth-Etch Deposition of Diamond Using a Chopped Oxygen-Acetylene Flame.
Patent, Filed 4 Nov 94, patented 9 Apr 96,
DEPARTMENT OF THE NAVY WASHINGTON DC
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A novel apparatus and method for the cyclic growth-etch deposition of diamond on a substrate by flame chemical vapor deposition CVD is developed. The cyclic growth-etch diamond deposition is accomplished by placing a suitable substrate to be coated under a CVD flame and providing a disk or face plate or other shapes having one or more teeth or holes wherein upon rotation of the disk, or face plate or other shape, the teeth attached to the disk, or face plate, or other shape obstruct the path of the CVD flame from contacting the substrate at a desired time scale of Tsub growth and tsub cycle to produce high quality FWHM of 1-3.5cm diamond.
- Inorganic Chemistry
- Physical Chemistry
- Combustion and Ignition