Accession Number:

ADD015660

Title:

Control of Crystallite Size in Diamond Film Chemical Vapor Deposition.

Descriptive Note:

Patent, Filed 16 May 91, patented 8 Dec 92,

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Report Date:

1992-12-08

Pagination or Media Count:

8.0

Abstract:

In depositing an adhering, continuous, polycrystalline diamond film of optical or semiconductor quality on a substrate, as by forming on the substrate a layer of a refractory nitride interlayer and depositing diamond on the interlayer without mechanical treatment or seeding of the substrate or the interlayer, the substrate is heated in a vacuum chamber containing a microwave activated mixture of hydrogen and a gas including carbon. and the size of deposited diamond crystallites and their rate of deposition selectively varied by a bias voltage applied to the substrate.

Subject Categories:

  • Physical Chemistry
  • Crystallography
  • Ceramics, Refractories and Glass
  • Coatings, Colorants and Finishes

Distribution Statement:

APPROVED FOR PUBLIC RELEASE