Method of Pattern Transfer in Photolithography Using Laser Induced Metallization.
Patent, Filed 28 Sep 90, patented 15 Dec 92,
DEPARTMENT OF THE NAVY WASHINGTON DC
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Method for improved photolithography using a laser induced metallization process to produce a metal mask wherein a work piece surface is treated to have a predetermined pattern of at least two materials each having different electron band gaps, the treated work piece is positioned in a metallizing solution, and the workpiece is exposed to a laser beam having a wavelength corresponding to the electron gap of a selected one of the materials. The method can advantageously be used to produce ohmic contacts for microcircuit devices.
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