Accession Number:

ADD015648

Title:

Method of Pattern Transfer in Photolithography Using Laser Induced Metallization.

Descriptive Note:

Patent, Filed 28 Sep 90, patented 15 Dec 92,

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Report Date:

1992-12-15

Pagination or Media Count:

7.0

Abstract:

Method for improved photolithography using a laser induced metallization process to produce a metal mask wherein a work piece surface is treated to have a predetermined pattern of at least two materials each having different electron band gaps, the treated work piece is positioned in a metallizing solution, and the workpiece is exposed to a laser beam having a wavelength corresponding to the electron gap of a selected one of the materials. The method can advantageously be used to produce ohmic contacts for microcircuit devices.

Subject Categories:

  • Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE