Organometallic Antimony Compounds Useful in Chemical Vapor Deposition Processes.
Patent, Filed 29 Sep 89, patented 2 Oct 90,
DEPARTMENT OF THE NAVY WASHINGTON DC
Pagination or Media Count:
Organometallic antimony compounds having increased stability that are useful in chemical vapor deposition processes are provided which comprise stibines containing sterically-demanding ligands, stibines lacking beta hydrogen atoms, or aromatic stibines. These compounds will generally have the formula SbRnX3-n wherein R is selected from the group consisting of neopentyl, 2-ethylbutyl, 1-ethylpropyl, perhaloalkanes having 3-5 carbon atoms, benzyl, fluoro-substituted phenyl, cyclopentyl, and pentamethycyclopentadienyl X is selected form the group consisting of Br, Cl, I and H and wherein n is an integer from 1 to 3. These compounds exhibit increased thermal stability and are thus advantageously used as substitutes for arsenic or other group V metals in chemical vapor deposition processes. Because of the bulky ligand group bound to the antimony andor the lack of beta hydrogen atoms in the ligand, theses organometallic stibines are less prone to decompose prematurely and thus exhibit greater thermal stability than previously known alkyl antimony hydride compounds. ttl
- Organic Chemistry
- Inorganic Chemistry