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An X-Ray Source for Lithography.
Patent Application, Filed 9 May 90,
DEPARTMENT OF THE NAVY WASHINGTON DC
Pagination or Media Count:
This patent application discloses an x-ray lithography device in which a beam of electrons interacts with a microwave field of a quasi-optical maser such as a quasi-optical gyrotron. This maser comprises a pair of spaced mirrors defining a quasi-optical cavity there between, with one mirror being provided with an orifice to permit extraction of the x-ray beam produced. A Bragg reflector is connected to the mirror orifice to reduce the microwave power loss from the device through the orifice. Electrons injected in the maser cavity are caused to wiggle by the interacting microwave field, which functions as an undulator, so as to produce a non-coherent x-ray beam that travels along the longitudinal axis of the cavity and exits through the mirror orifice. rh
APPROVED FOR PUBLIC RELEASE