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Accession Number:
ADD014498
Title:
Formation of High T(c) Superconducting Films by Organometallic Chemical Vapor Deposition.
Descriptive Note:
Patent Application, Filed 16 May 89,
Corporate Author:
DEPARTMENT OF THE NAVY WASHINGTON DC
Report Date:
1989-05-16
Pagination or Media Count:
25.0
Abstract:
This invention relates to a method of forming high Tc superconducting films by organometallic chemical vapor deposition. More specifically, this invention relates to a method of forming superconducting films on a semiconductor surface by chemical vapor deposition of volatile organometallic compounds of the rare earth and alkaline earth elements, and copper. Keywords Reports, Periodicals, Military publications, Scientific literature. eg
Distribution Statement:
APPROVED FOR PUBLIC RELEASE