Formation of High T(c) Superconducting Films by Organometallic Chemical Vapor Deposition.
Patent Application, Filed 16 May 89,
DEPARTMENT OF THE NAVY WASHINGTON DC
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This invention relates to a method of forming high Tc superconducting films by organometallic chemical vapor deposition. More specifically, this invention relates to a method of forming superconducting films on a semiconductor surface by chemical vapor deposition of volatile organometallic compounds of the rare earth and alkaline earth elements, and copper. Keywords Reports, Periodicals, Military publications, Scientific literature. eg
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