Volatile Divalent Metal Alkoxides.
Patent Application, Filed 31 Jul 89,
DEPARTMENT OF THE NAVY WASHINGTON DC
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This invention relates to volatile divalent metal alkoxides useful for the CVD deposition of metal oxides to a substrate. More particularly, this invention relates to volatile alkoxides of barium, strontium, or calcium used to deposit oxides used to make thin, superconducting copper oxide films. The precursors have the formula M OR2, wherein M is selected from the group consisting of Barium, Calcium, and Strontium, and R is selected from the group consisting of unsubstituted alkyl groups of 6 to 13 carbons and halogen substituted alkyl groups of 3 to 4 carbons wherein the halogen is selected from two of the halogen substitutions are fluorine. The secondary or tertiary alkyl groups are preferred and the tertiary alkyl groups are most preferred. Keywords Chemical vapor deposition, Patent applications. aw
- Solid State Physics
- Electricity and Magnetism