Method of Etching Titanium Diboride.
Patent Application, Filed 16 Feb 88,
DEPARTMENT OF THE ARMY WASHINGTON DC
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The invention described herein may be manufactured, used, and licensed by or for the Government for governmental purposes without the payment to me of any royalty thereon. This invention relates in general to a method of etching titanium diboride and in particular to a method of dry etching a thin film of titanium diboride that has been deposited onto a substrate and patterned using photolithography. Titanium diboride has become of interest in laboratory research because of its resistance to change or degradation at high temperatures. It also shows promise in acting as a diffusion barrier to other metals.
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