Phenylquinoxaline Resin Monomers.
Patent, Filed 16 Jan 86, patented 28 Jul 87,
DEPARTMENT OF THE AIR FORCE WASHINGTON DC
Pagination or Media Count:
This invention relates to phenylquinoxaline monomers. The acetylene-terminated polyphenylquinoxalines disclosed in U.S. Pat Nos. 3,966,729 and 4,147,868 represent promising new matrix resins for advanced structural materials. These materials propagate and cure by addition reactions to form high molecular weight, thermally stable compositions. The addition process obviates all problems associated with volatile by-product formation that occurs when such materials are prepared by condensation processes.
- Polymer Chemistry