Deposition of Compounds from Multi-Component Organo-Metals.
DEPARTMENT OF THE NAVY WASHINGTON DC
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This invention relates to the preparation of temperature sensitive II-VI semiconductors by the decomposition via photolysis or low temperature thermolysis or pyrolysis of organo-metallic compounds. The present invention has overcome some of the previous problems by incorporating the desired target molecule to be deposited directly into the organo-metallic compound. The target molecule is chemically bonded within the organo-metallic compound until released by the breaking of the organo-metallic bonds. A film having the formula A superscript B superscript VIA wherin A IIB is a group IIB metal and B superscript is a chalcogenide is deposited upon a substrate by exposing the substrate to an environment containing a decomposable organo-metallic compound selected from the group consisting of R-X-M-X-R, R-M-X-M-R, R-M-X-R, R-M-CH2-X-R and R-M-X-X-R wherein R and R are each selected from the group consisting of hydrogen, an organic radical such as an alkyl or an aryl and an organic radical containing a heroatom M is a group IIB metal and X is a chalcogenide, followed by decomposing the organo-metallic compound through photolysis or low temperature thermolysis or pyrolysis to deposit a film including the target molecule that was within the organo-metallic compound.
- Inorganic Chemistry
- Organic Chemistry