Accession Number:

ADD012827

Title:

Vanadium Dioxide Film Deposition.

Descriptive Note:

Patent,

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s):

Report Date:

1987-03-31

Pagination or Media Count:

8.0

Abstract:

A method of producing high quality stoichiometric thin films of vanadium dioxide by reactive evaporations utilizes an electron beam to evaporate a source of vanadium in a controlled, low pressure oxygen gas environment with the film being deposited at a predetermined rate onto a substrate which is heated to and maintained at a predetermined temperature above 500 C.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE