Method of Chemically Polishing Fuzed Quartz.
DEPARTMENT OF THE ARMY WASHINGTON DC
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The general object of this invention is to provide a method of chemically polishing fused quartz. A more specific object of the invention is to provide such a method that enables one to remove surface damage such as microcracks from the surface of the fused quartz so that a good surface finish is obtained for device fabrication. Fused quartz is chemically polished by lapping the fused quartz, treating the lapped fused quartz with an etchant at high pressure in a high pressure vessel while agitating to circulate the etchant and maintaining a uniform temperature throughout the etchant, cooling the vessel, removing the fused quartz, rinsing thoroughly with water and spinning dry.
- Manufacturing and Industrial Engineering and Control of Production Systems
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