Accession Number:

ADD012606

Title:

Method of Chemically Polishing Fuzed Quartz.

Descriptive Note:

Patent Application,

Corporate Author:

DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s):

Report Date:

1986-10-20

Pagination or Media Count:

9.0

Abstract:

The general object of this invention is to provide a method of chemically polishing fused quartz. A more specific object of the invention is to provide such a method that enables one to remove surface damage such as microcracks from the surface of the fused quartz so that a good surface finish is obtained for device fabrication. Fused quartz is chemically polished by lapping the fused quartz, treating the lapped fused quartz with an etchant at high pressure in a high pressure vessel while agitating to circulate the etchant and maintaining a uniform temperature throughout the etchant, cooling the vessel, removing the fused quartz, rinsing thoroughly with water and spinning dry.

Subject Categories:

  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Electricity and Magnetism

Distribution Statement:

APPROVED FOR PUBLIC RELEASE