Process for Fabricating Cryogenic Targets and Targets Made Thereby.
DEPARTMENT OF THE NAVY WASHINGTON DC
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This patent discloses a process for patterning a target for lasing at X-ray wavelengths from materials which cannot be readily shaped. A substrate of one material is placed in a gaseous atmosphere of another material, and the substrate is cooled below the freezing point of the other material condenses onto the substrate. Part of the frozen layer of the other material is masked, and the unmasked part of the frozen layer is vaporized so that the substrate of the one material is coated with the other material according to the pattern of the mask. The target made by the process is also disclosed.
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