Accession Number:

ADD010984

Title:

Method for Forming High Superconducting Niobium Nitride Film at Ambient Temperature.

Descriptive Note:

Patent,

Corporate Author:

DEPARTMENT OF THE NAVY WASHINGTON DC

Personal Author(s):

Report Date:

1984-01-17

Pagination or Media Count:

4.0

Abstract:

A method of forming a high Tc niobium nitride NbN film on a substrate at ambient substrate temperature. The method includes the step of reactively sputtering NbN onto the substrate in an argon-nitrogen atmosphere with controlled amounts of methane added to the argon-nitrogen gas mixture. Author

Subject Categories:

  • Electrical and Electronic Equipment
  • Electricity and Magnetism
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE