Accession Number:

ADD009523

Title:

Process for Developing a Negative Electron Resist.

Descriptive Note:

Patent Application,

Corporate Author:

DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s):

Report Date:

1982-06-16

Pagination or Media Count:

8.0

Abstract:

A method of developing a negative electron resist for delineating a desired integrated circuit pattern upon a circuit substrate is disclosed for a negative resist consisting of a copolymer film of polyglycidyl methacrylate-co-styrene using a mixture of 11 chlorobenzene and 2- propanol as the developer. Author

Subject Categories:

  • Coatings, Colorants and Finishes
  • Plastics
  • Particle Accelerators

Distribution Statement:

APPROVED FOR PUBLIC RELEASE