Process for Developing a Negative Electron Resist.
DEPARTMENT OF THE ARMY WASHINGTON DC
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A method of developing a negative electron resist for delineating a desired integrated circuit pattern upon a circuit substrate is disclosed for a negative resist consisting of a copolymer film of polyglycidyl methacrylate-co-styrene using a mixture of 11 chlorobenzene and 2- propanol as the developer. Author
- Coatings, Colorants and Finishes
- Particle Accelerators