Method of Forming Thin Niobium Carbonitride Superconducting Films of Exceptional Purity.
DEPARTMENT OF THE NAVY WASHINGTON DC
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Thin superconducting NbCN films are deposited by reactive sputtering onto a dielectric substrate inside a vacuum chamber. The substrate is heated to a temperature of 600-1200 C ultra-pure Argon is introduced into the chamber, and niobium is presputtered from a high-purity target onto a shutter. A cyanogen and nitrogen gas mixture is introduced into the chamber at a rate of approximately 10-6 Torr literssec, and a shutter is opened exposing the substrate to the sputtered niobium. The deposited niobium reacts with the cyanogen-nitrogen gas mixture to form NbCN films of exceptional purity, and which exhibit superior superconductor properties. Author
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