Accession Number:

ADD007596

Title:

Method of Chemically Polishing a Doubly Rotated Quartz Plate.

Descriptive Note:

Patent Application,

Corporate Author:

DEPARTMENT OF THE ARMY WASHINGTON DC

Personal Author(s):

Report Date:

1980-05-08

Pagination or Media Count:

16.0

Abstract:

The general object of this invention is to provide a method of chemically polishing a doubly rotated quartz plate. A more particular object of the invention is to provide such a method that will chemically polish a doubly rotated quartz plate whose theta angle is between about 33 deg and 36 deg and whose phi angle is between about 10 deg and 26 deg. A particular object of the invention is to provide a method of chemically polishing an SC-cut doubly rotated quartz plate. Another object of the invention is to provide a method of making quartz plates of great strength suitable for high shock resonator applications. Author

Subject Categories:

  • Ceramics, Refractories and Glass
  • Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE