Method of Chemically Polishing a Doubly Rotated Quartz Plate.
DEPARTMENT OF THE ARMY WASHINGTON DC
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The general object of this invention is to provide a method of chemically polishing a doubly rotated quartz plate. A more particular object of the invention is to provide such a method that will chemically polish a doubly rotated quartz plate whose theta angle is between about 33 deg and 36 deg and whose phi angle is between about 10 deg and 26 deg. A particular object of the invention is to provide a method of chemically polishing an SC-cut doubly rotated quartz plate. Another object of the invention is to provide a method of making quartz plates of great strength suitable for high shock resonator applications. Author
- Ceramics, Refractories and Glass
- Manufacturing and Industrial Engineering and Control of Production Systems