Pulsed X-Ray Lithography.
DEPARTMENT OF THE NAVY WASHINGTON DC
Pagination or Media Count:
A method and means for x-ray lithography which utilizes means for producing in a vacuum system a high temperature plasma for which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired pattern on the substrate. The x-ray spectrum has a significant energy in the 1-5 keV range. These x-rays pass through the support layer of the mask, stop in the pattern material gold of the mask or, where the pattern material is lacking, are absorbed adequately by the x-ray resist. Since there is very little energy above 5 KeV, there is little if any substrate damage due to the x-rays. Author
- Printing and Graphic Arts
- Solid State Physics