Accession Number:

ADD002374

Title:

Collimated X-Ray Source for X-Ray Lithographic System.

Descriptive Note:

Patent,

Corporate Author:

DEPARTMENT OF THE AIR FORCE WASHINGTON D C

Personal Author(s):

• Fenstermacher,Thomas E.

Report Date:

1976-03-30

Pagination or Media Count:

7.0

Abstract:

The patent relates to an X-ray lithographic system-high power X-ray illumination of photo-resist coated substrate members accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.

Descriptors:

• *Lithography
• *Patents
• X ray apparatus
• Photomasking
• X rays
• Collimators

Subject Categories:

• Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE