Collimated X-Ray Source for X-Ray Lithographic System.
DEPARTMENT OF THE AIR FORCE WASHINGTON D C
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The patent relates to an X-ray lithographic system-high power X-ray illumination of photo-resist coated substrate members accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.
- Printing and Graphic Arts