Accession Number:
ADD002374
Title:
Collimated X-Ray Source for X-Ray Lithographic System.
Descriptive Note:
Patent,
Corporate Author:
DEPARTMENT OF THE AIR FORCE WASHINGTON D C
Personal Author(s):
Report Date:
1976-03-30
Pagination or Media Count:
7.0
Abstract:
The patent relates to an X-ray lithographic system-high power X-ray illumination of photo-resist coated substrate members accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.
Descriptors:
Subject Categories:
- Printing and Graphic Arts