DID YOU KNOW? DTIC has over 3.5 million final reports on DoD funded research, development, test, and evaluation activities available to our registered users. Click
HERE to register or log in.
Accession Number:
ADD002374
Title:
Collimated X-Ray Source for X-Ray Lithographic System.
Descriptive Note:
Patent,
Corporate Author:
DEPARTMENT OF THE AIR FORCE WASHINGTON D C
Report Date:
1976-03-30
Pagination or Media Count:
7.0
Abstract:
The patent relates to an X-ray lithographic system-high power X-ray illumination of photo-resist coated substrate members accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.
Distribution Statement:
APPROVED FOR PUBLIC RELEASE