Accession Number:

ADA621659

Title:

Applying LaPO4 Phosphor via Spinning for BetaPhotovoltaic Devices

Descriptive Note:

Corporate Author:

ARMY RESEARCH LAB ADELPHI MD SENSORS AND ELECTRON DEVICES DIRECTORATE

Personal Author(s):

• Khan, Muhammad R.
• Smith, Joshua R.
• Kirchner, Kevin
• Jones, Kenneth A.

Report Date:

2015-06-01

Pagination or Media Count:

14.0

Abstract:

The semiconductor fabrication technique of spinning photoresist was modified and applied to the problem of creating a uniform coating of phosphor on a betaphotovoltaic BPV device. A mixture of phosphor was applied to 3 samples Si, GaN, and a GaN die with devices fabricated on its surface, and all 3 samples were spun at various speeds using a spinner. A uniform coating of phosphor was not achieved for 2 reasons the phosphor does not fully dissolve in water, and the phosphor mixture does not stick well to the samples.

Descriptors:

• *PHOTOELECTRIC CELLS(SEMICONDUCTOR)
• *PHOTORESIST COATINGS
• ADHESION
• DIES
• FABRICATION
• GALLIUM NITRIDES
• PHOSPHORS
• SEMICONDUCTORS
• SILICON
• SOLUBILITY
• SPINNING(INDUSTRIAL PROCESSES)
• SUBSTRATES

Subject Categories:

• Electrical and Electronic Equipment
• Coatings, Colorants and Finishes
• Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE