Applying LaPO4 Phosphor via Spinning for BetaPhotovoltaic Devices
ARMY RESEARCH LAB ADELPHI MD SENSORS AND ELECTRON DEVICES DIRECTORATE
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The semiconductor fabrication technique of spinning photoresist was modified and applied to the problem of creating a uniform coating of phosphor on a betaphotovoltaic BPV device. A mixture of phosphor was applied to 3 samples Si, GaN, and a GaN die with devices fabricated on its surface, and all 3 samples were spun at various speeds using a spinner. A uniform coating of phosphor was not achieved for 2 reasons the phosphor does not fully dissolve in water, and the phosphor mixture does not stick well to the samples.
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