Development of Antimicrobial Coatings by Atmospheric Pressure Plasma Using a Guanidine-Based Precursor
ARMY RESEARCH LAB ABERDEEN PROVING GROUND MD WEAPONS AND MATERIALS RESEARCH DIRECTORATE
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Antimicrobial coatings deposited onto ultra high molecular weight polyethylene UHMWPE films were investigated using an atmospheric pressure plasma enhanced chemical vapor deposition AP-PECVD process. Varying concentrations of a guanidine-based liquid precursor, 1,1,3,3-tetramethylguanidine, were used, and different deposition conditions were studied. Attenuated total reflectance Fourier Transform Infrared ATR-FTIR spectroscopy and X-ray Photoelectron Spectroscopy XPS were used to study the chemical structure and elemental composition of the coatings. Conformity, morphology, and coating thickness were assessed through SEM and AFM. Optimal AP-PECVD parameters were chosen and applied to deposit guanidine coatings onto woven fabrics. The coatings exhibited high antimicrobial activity against Escherichia coli E. coli and Staphylococcus aureus S. aureus based on a modified-AATCC 100 test standard, where 2 5 log reductions were achieved.
- Organic Chemistry
- Physical Chemistry
- Coatings, Colorants and Finishes
- Plasma Physics and Magnetohydrodynamics