Accession Number:

ADA604686

Title:

X-ray Standing Wave Analysis for Bromine Chemisorbed on Silicon

Descriptive Note:

Journal article

Corporate Author:

STATE UNIV OF NEW YORK AT ALBANY DEPT OF PHYSICS

Personal Author(s):

• Bedzyk, M. J.
• Gibson, W. M.
• Golovchenko, J. A.

Report Date:

1982-03-01

Pagination or Media Count:

5.0

Abstract:

X-ray standing wave measurements on single crystals of silicon are used to determine the coverage and position of chemisorbed bromine. Detailed analysis of the position information leads to the conclusion that silicon surface atoms bonded to adsorbed bromine atoms are in extrapolated bulk-line positions. Direct measurement of the desorption of correlated bromine in air demonstrates the high stability of the BrSi surface interface.

Descriptors:

• *BROMINE
• *SILICON
• *STANDING WAVES
• *X RAYS
• ATOMS
• CRYSTALS

Subject Categories:

• Inorganic Chemistry
• Nuclear Physics and Elementary Particle Physics
• Radiofrequency Wave Propagation

Distribution Statement:

APPROVED FOR PUBLIC RELEASE