Deposition of Crystalline Layers on Polymer Substrates Using Nanoparticles and Laser Nanoforming
Patent, Filed 15 Mar 2007, patented 6 Apr 2010
UNIVERSITY OF CENTRAL FLORIDA ORLANDO CENTER FOR RESEARCH AND EDUCATION IN OPTICS AND LASERS
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A method of forming crystalline semiconducting layers on low melting or low softening point substrates includes the steps of providing an aqueous solution medium including a plurality of semiconductor nanoparticles dispersed therein having a median size less than 10 nm, and applying the solution medium to at least one region of a substrate to be coated. The substrate has a melting or softening point of 200 deg C. The solution medium is evaporated and the at least one region is laser irradiated for fusing the nanoparticles followed by annealing to obtain a continuous film having a recrystallized microstructure. An article includes a polycrystalline semiconducting layer including a plurality of crystallites predominately in the size range of 2 to 50 micro m, and a substrate having a melting or softening point of 200 deg C. supporting the semiconducting layer. An average grain size of the crystallites is less at an interface proximate to the semiconducting layer as compared to an average grain size further away from the interface.
- Electrical and Electronic Equipment
- Lasers and Masers