Accession Number:

ADA595711

Title:

Spoof-Like Plasmonic Behavior of Plasma Enhanced Atomic Layer Deposition Grown Ag Thin Films

Descriptive Note:

Journal article

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Report Date:

2012-01-30

Pagination or Media Count:

4.0

Abstract:

The plasmonic behavior of Ag thin films produced by plasma enhanced atomic layer deposition PEALD has been investigated. We show that as-deposited flat PEALD Ag films exhibit unexpected plasmonic properties, and the plasmonic enhancement can differ markedly, depending on the microstructure of the Ag film. Electromagnetic field simulations indicate that this plasmonic behavior is due to air gaps that are an inherent property of the mosaic-like microstructure of the PEALD-grown Ag film, suggesting that this is a metamaterial with behavior very similar to what would be expected in spoof plasmonics where gaps are fabricated in films to create plasmonic-like resonances.

Subject Categories:

  • Radiofrequency Wave Propagation

Distribution Statement:

APPROVED FOR PUBLIC RELEASE