Accession Number:

ADA591474

Title:

Structural and Optical Properties of Thick Freestanding AlN Films Prepared by Hydride Vapor Phase Epitaxy

Descriptive Note:

Journal article

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Report Date:

2012-01-01

Pagination or Media Count:

6.0

Abstract:

The morphology, structural and optical properties of void-assisted freestanding HVPE-AlN films were investigated by a combination of non-destructive microscopic and spectroscopic techniques. The freestanding approximately 80 mm thick clear film has a wurtzite crystalline structure with remarkable properties around the central film region. The E2high-phonon frequency coincides with reported stress-free film phonon frequency. The low temperature luminescence study of the growth and interface sides of the film is consistent with the incorporation of a high concentration of oxygen impurities. These results are promising as the growth method amenable to the production of freestanding stress-free large area substrates for epitaxial growth.

Subject Categories:

  • Inorganic Chemistry
  • Physical Chemistry
  • Crystallography
  • Optics
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE