Accession Number:

ADA588202

Title:

New PVD Technologies for New Ordnance Coatings

Descriptive Note:

Technical rept. Sep 2008-Sep 2010

Corporate Author:

ARMY ARMAMENT RESEARCH DEVELOPMENT AND ENGINEERING CENTER WATERVLIET NY BENET LABS

Personal Author(s):

• Lee, S. L.
• Wei, R.
• Lin, J.
• Chistyakov, R.
• Schmidt, D.
• Cipollo, M.
• Yee, F.
• Todaro, M.

Report Date:

2012-04-01

Pagination or Media Count:

31.0

Abstract:

This report summarizes a two-year effort on an EQBRD project. The objective was to research and develop new plasma enhanced physical vapor deposition technologies for deposition of pollution-free coatings for protection of armament components to extend cycle life. In this paper, technology research and development included 1 Physical Vapor Deposition processes including plasma enhanced magnetron with external ion source, High Power Impulse Magnetron Sputtering HIPIMS, and Modulated Pulsed Power MPP 2 Innovations of the HIPIMS and MPP processes based on the physics of Ionized Physical Vapor Deposition 3 The plasma ion and mass characteristics using a Tantalum and a Chrome target 4 Deposition of Ta coatings and reactive deposition of CrN 5 Deposition parameters affecting film nucleation and growth properties 6 Coatings characterization.

Descriptors:

• *COATINGS
• *VAPOR DEPOSITION
• CHROMIUM
• ELECTROPLATING
• MAGNETRONS
• TANTALUM

Subject Categories:

• Coatings, Colorants and Finishes
• Metallurgy and Metallography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE