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New PVD Technologies for New Ordnance Coatings
Technical rept. Sep 2008-Sep 2010
ARMY ARMAMENT RESEARCH DEVELOPMENT AND ENGINEERING CENTER WATERVLIET NY BENET LABS
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This report summarizes a two-year effort on an EQBRD project. The objective was to research and develop new plasma enhanced physical vapor deposition technologies for deposition of pollution-free coatings for protection of armament components to extend cycle life. In this paper, technology research and development included 1 Physical Vapor Deposition processes including plasma enhanced magnetron with external ion source, High Power Impulse Magnetron Sputtering HIPIMS, and Modulated Pulsed Power MPP 2 Innovations of the HIPIMS and MPP processes based on the physics of Ionized Physical Vapor Deposition 3 The plasma ion and mass characteristics using a Tantalum and a Chrome target 4 Deposition of Ta coatings and reactive deposition of CrN 5 Deposition parameters affecting film nucleation and growth properties 6 Coatings characterization.
APPROVED FOR PUBLIC RELEASE