Accession Number:

ADA585453

Title:

Microhollow Cathode Plasmas for Low Temperature, Ambient Diamond Growth

Descriptive Note:

Final rept. 19 Nov 2010-9 Sep 2011

Corporate Author:

SRI INTERNATIONAL MENLO PARK CA

Personal Author(s):

Report Date:

2011-09-09

Pagination or Media Count:

17.0

Abstract:

SRI International SRI has conducted a detailed study of localized hydrocarbonhydrogen plasmas for the purpose of depositing diamond thin films near atmospheric pressure and at low temperature. A microhollow cathode device was utilized to generate localized plasmas which were characterized spectroscopically. In addition, the electron density of these plasmas was predicted through computer generated simulations.

Subject Categories:

  • Geology, Geochemistry and Mineralogy
  • Electrical and Electronic Equipment
  • Properties of Metals and Alloys
  • Plasma Physics and Magnetohydrodynamics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE