Fabrication and Characterization of Compact Silicon Oxynitride Waveguides on Silicon Chips
RUTGERS - THE STATE UNIV PISCATAWAY NJ DEPT OF ELECTRICAL AND COMPUTER ENGINEERING
Pagination or Media Count:
We investigate silicon oxynitride SiON waveguides for long optical delay lines on a silicon chip. With the choice of a moderately low refractive index contrast, a balance can be achieved between compact waveguide cross-section and low loss. The material composition and refractive index are characterized by Rutherford backscattering spectrometry and ellipsometry. High-temperature annealing is performed after waveguide fabrication so as to simultaneously remove light absorbing bonds in the materials and smooth the sidewall roughness at the corecladding interface. A meter-long SiON waveguide is demonstrated on a centimeter scale chip.
- Electrical and Electronic Equipment