Accession Number:

ADA555516

Title:

Direct-Write Polymer Nanolithography in Ultra-High Vacuum

Descriptive Note:

Journal article

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC CHEMISTRY DIV

Report Date:

2012-01-19

Pagination or Media Count:

6.0

Abstract:

Polymer nanostructures were directly written onto substrates in ultra-high vacuum. The polymer ink was coated onto atomic force microscope AFM probes that could be heated to control the ink viscosity. Then, the ink-coated probes were placed into an ultrahigh vacuum UHV AFM and used to write polymer nanostructures on surfaces, including surfaces cleaned in UHV. Controlling the writing speed of the tip enabled the control over the number of monolayers of the polymer ink deposited on the surface from a single to tens of monolayers, with higher writing speeds generating thinner polymer nanostructures. Deposition onto silicon oxideterminated substrates led to polymer chains standing upright on the surface, whereas deposition onto vacuum reconstructed silicon yielded polymer chains aligned along the surface.

Subject Categories:

  • Polymer Chemistry
  • Electrical and Electronic Equipment
  • Fluid Mechanics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE