Accession Number:

ADA535013

Title:

Hyper-Uniform Site-Controlled Quantum Dot Arrays Prepared by Soft Nano-Imprint Lithography Technology

Descriptive Note:

Final rept. 1 Oct 2009-30 Jun 2010

Corporate Author:

ILLINOIS UNIV CHAMPAIGN

Personal Author(s):

Report Date:

2010-10-24

Pagination or Media Count:

7.0

Abstract:

One of the biggest stumbling blocks in semiconductor nanotechnology today is the inability to manufacture quantum dot QD arrays with uniformity of QD size and spacing. This report describes a comprehensive research program to achieve dense 10exp 10 cm-squared QDs with uniform size and spacing, over large areas, with luminescence suitable for optoelectronics device applications. The described techniques require only easily available equipment, and are inherently parallel and suitable for high-volume production. The method to achieve regularly-spaced QD arrays relies on soft nano-print lithography to pre-pattern a semiconductor GaAs substrate into nanometer scale pores array with sub-100 nm periodicity, followed by regrowth of InAs QDs on top. The uniform nano-pore pattern on GaAs causes InAs QD nucleation only at designed loca-tions with uniform size, leading to an array of uniform-sized site-controlled QDs SCQD. The proposal addresses specific challenges that preliminary study of 200nm pitch SCQD arrays has identified, along with studying and managing the complex interplay of all the process variables to get an optimal result.

Subject Categories:

  • Physical Chemistry
  • Electrical and Electronic Equipment
  • Electrooptical and Optoelectronic Devices
  • Quantum Theory and Relativity

Distribution Statement:

APPROVED FOR PUBLIC RELEASE