Accession Number:

ADA533174

Title:

UV-LIGA Microfabrication of 220 GHz Sheet Beam Amplifier Gratings with SU-8 Photoresists

Descriptive Note:

Journal article

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Report Date:

2010-01-01

Pagination or Media Count:

13.0

Abstract:

Microfabrication techniques have been developed using ultraviolet photolithography UV-LIGA with SU-8 photoresists to create advanced sheet beam amplifier circuits for the next generation of vacuum electron traveling wave amplifiers in the 210-220 GHz G-band frequency regime. We describe methods that have led to successfully fabricated millimeter wave circuits, including applying ultra-thick SU-8 photoresist layers on copper, copper electroforming solutions, and the challenging removal of the SU-8 photoresists. A table of experimental liquid SU-8 removal chemistries and results is also presented.

Subject Categories:

  • Printing and Graphic Arts
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE