Accession Number:

ADA525838

Title:

Hierarchical Assembly and Compliance of Aligned Nanoscale Polymer Cylinders in Confinement

Descriptive Note:

Journal article

Corporate Author:

CHICAGO UNIV IL DEPT OF CHEMISTRY

Report Date:

2004-01-01

Pagination or Media Count:

10.0

Abstract:

We report a combined top-downbottom-up hierarchical approach to fabricate massively parallel arrays of aligned nanoscale domains by means of the self-assembly of asymmetric polystyrene-block-polyethylene-alt-propylene diblock copolymers. Silicon nitride grating substrates of various depths and periodicities are used to template the alignment of the high-aspect-ratio cylindrical polymer domains. Alignment is nucleated by polystyrene preferentially wetting the trough sidewalls and is thermally extended throughout the polymer film by defect annihilation. Topics discussed include a detailed analysis of the capacity of this system to accommodate lithographic defects and observations of alignment beyond the confined channel volumes. This graphoepitaxial methodology can be exploited in hybrid hardsoft condensed matter systems for a variety of applications.

Subject Categories:

  • Polymer Chemistry
  • Plastics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE