Accession Number:

ADA513785

Title:

High-Resolution, Large-Area, Nano Imprint Lithography

Descriptive Note:

Final rept. 5 Jan 2008-4 Jan 2009

Corporate Author:

SEOUL NATIONAL UNIV SEOUL (KOREA SOUTH) SCHOOL OF MATERIALS SCIENCE

Report Date:

2009-08-27

Pagination or Media Count:

52.0

Abstract:

This document contains results from four different basic research projects under the Phase I of US-Korea NBIT Program 2007-2010. It is the 2nd year results covering research results from 2008-2009. It begins with the fourth report, High-resolution, Large-Area, Nano Imprint Lithography Using Electron Lattice Images and Electron-emitting Nanoprobes by US primary investigator, Prof. Sungho Jin, UC San Diego, and the Korean primary investigator, Ki-Bum Kim, Seoul National University. It is followed by chapters 1 SiGe Alloy Nanowire Photonics by Prof. Moon-Ho Jo, Department of Materials Science and Engineering, POSTECH, Korea and Prof. Hongkun Park, Department of Chemistry and Chemical Biology, Harvard University 2Self-Assembled Liquid Crystalline Gels From Nanostructure to Function by Prof. Soo-Young Park, Department of Polymer Science, Kyungpook National University, Korea 3 Extremely Low Noise CNT for Peltier and Photo- Detector Device Application by Prof. Young-Hee Lee, Department of Physics, SungKyunkwan University, Korea, Moon J. Kim, University of Texas at Dallas, and Minhee Yun, University of Pittsburgh.

Subject Categories:

  • Polymer Chemistry
  • Electrical and Electronic Equipment
  • Machinery and Tools

Distribution Statement:

APPROVED FOR PUBLIC RELEASE