Accession Number:

ADA513618

Title:

Focused Ion Beam Milling Applied in Future Tunable-Wavelength Nano-LED's Fabrication

Descriptive Note:

Final rept. 8 Jun 2008-9 Jun 2009

Corporate Author:

NATIONAL CHENG KUNG UNIV TAINAN (TAIWAN)

Personal Author(s):

Report Date:

2010-01-07

Pagination or Media Count:

8.0

Abstract:

This is a report on the development of a technique of self-masking lithography for making high aspect-ratio nanopillars by using a volume swelling phenomenon during beam-material interactions.

Subject Categories:

  • Electrooptical and Optoelectronic Devices
  • Test Facilities, Equipment and Methods
  • Particle Accelerators
  • Quantum Theory and Relativity

Distribution Statement:

APPROVED FOR PUBLIC RELEASE