Accession Number:

ADA503737

Title:

Protection of Polymer from Atomic-Oxygen Erosion using Al2O3 Atomic Layer Deposition Coatings

Descriptive Note:

Journal article

Corporate Author:

MONTANA STATE UNIV BOZEMAN DEPT OF CHEMISTRY AND BIOCHEMISTRY

Report Date:

2008-01-01

Pagination or Media Count:

5.0

Abstract:

Thin films of Al2O3 grown using atomic layer deposition ALD techniques can protect polymers from erosion by oxygen atoms. To quantify this protection, polyimide substrates with the same chemical repeat unit as Kapton registered trademark were applied to quartz crystal microbalance QCM sensors. Al2O3 ALD films with varying thicknesses were grown on the polyimide substrates. The ALD-coated polyimide materials were then exposed to a hyperthermal atomic-oxygen beam. The mass loss versus oxygen-atom exposure time was measured in situ by the QCM. Al2O3 ALD film thicknesses of 35 angstroms were found to protect the polymer from erosion.

Subject Categories:

  • Coatings, Colorants and Finishes
  • Plastics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE